This report summarizes high-rate sputtering techniques using electron cyclotron resonance (ECR) and electric-mirror excitations. Electron cyclotron waves propagating along the magnetic flux are the most useful for producing over-dense plasma. Microwaves channeled perpendicular to the magnetic flux are efficient for preparing conductive-films. Electron cyclotron waves and ordinary waves generate dense plasmas of 10¹² cm^-3 and 10¹¹ cm^-3, respectively. These densities are much higher than the cutoff density of 7xl0¹⁰ cm^-3. Some target arrangements are developed for preparing films at high rates. These include a magnetron arrangement with a single cylindrical target and an electric-mirror arrangement composed of planar and cylindrical targets. Low-energy ions with minimal dispersion are extracted from the ECR plasma by applying a mirror field. These techniques can prepare various high-quality films. A magnetic mirror arrangement was also developed for high-efficiency sputtering in a ultra-high vacuum below 10^-3 Pa. Multi-charged particles are generated in the plasma and highly efficient self-sputtering is achieved. An electric mirror arrangement without ECR plasma excitation can also be applied to the sputtering source and a broad-beam metal-ion source. This achieves direct ion beam deposition (IBD).