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Current Topics in Crystal Growth Research   Volumes    Volume 1 
Abstract
Metal Organic Vapor Phase Epitaxy for production of compound semiconductors
Koh Matsumoto, T. Arai, K. Uematsu, T. Yamazaki, H. Tokunaga, A. Yamaguchi
Pages: 285 - 292
Number of pages: 8
Current Topics in Crystal Growth Research
Volume 1 

Copyright © 1994 Research Trends. All rights reserved

ABSTRACT
 
This paper describes the cost analysis of epitaxial layers grown by Metal Organic Vapor Phase Epitaxy and the instruction of scaling-up of a horizontal reactor. Important factors that determine the cost are discussed. The method to get a uniform layer in terms of its properties by a horizontal reactor is presented. The separate laminar flow injection of group III and V elements to improve growth efficiency is also described.
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