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Trends in Vacuum Science & Technology   Volumes    Volume 4 
Abstract
Physics and application of dusty low pressure plasmas
E. Stoffels, W. W. Stoffels
Pages: 1 - 35
Number of pages: 35
Trends in Vacuum Science & Technology
Volume 4 

Copyright © 2001 Research Trends. All rights reserved

ABSTRACT

This paper surveys the state of the art knowledge on dusty low-pressure plasmas. In the beginning fundamental aspects of dusty plasmas are treated. Behaviour of dust particles in the plasma is described, with emphasis on dust charging, forces acting on the particles and the influence of dust on various plasma properties. Further, dust formation mechanisms are reviewed. Homogeneous and heterogeneous nucleation of particles in surface-processing plasmas is treated. In the description of technological applications of dusty plasmas, methods of particle synthesis and surface modification are discussed. This work concludes with the presentation of various diagnostic methods of dusty plasmas.

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