ABSTRACT Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is one of the most surface sensitive techniques for surface analysis. It is, however, a qualitative technique owing largely to its extremely sensitivity to the chemical environment at the sample surfaces. In addition, although it is believed that TOF-SIMS is an extreme surface technique detecting only at about one to two monolayer from the sample surface, the actual probing depth remains ambiguous. This article reviews the current advancement in TOF-SIMS quantitative approaches and the understanding in TOF-SIMS probing depth.
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