ABSTRACT

The compounds that can generate acids or bases upon irradiation of light were briefly reviewed. These compounds are called photoacid generators or photobase generators, respectively. In this review chemistry of photoacid generators and photobase generators is described. Photoacid generators are divided into two groups, i.e., ionic and non-ionic types. Photobase generators were not so many kinds as photoacid generators. Photoresists are polymeric materials which become soluble or insoluble in developers, when irradiated with light. The photochemically generated acid- or base-induced reactions which are used for the development of photoresists are discussed. The application of photoacid generators to the plasma developable photoresist system is also described.