Home | My Profile | Contact Us
Research Trends Products  |   order gateway  |   author gateway  |   editor gateway  
Register | Forgot Password

Author Resources
 Author Gateway
 Article submission guidelines

Editor Resources
 Editor/Referee Gateway

 Regional Subscription Agents/Distributors
Trends in Chemical Engineering   Volumes    Volume 6 
Fine particle coating by chemical vapor deposition for functional materials
Boris Golman, Kunio Shinohara
Pages: 1 - 16
Number of pages: 16
Trends in Chemical Engineering
Volume 6 

Copyright © 2000 Research Trends. All rights reserved


An application of different types of chemical vapor deposition (CVD) reactors is reviewed for the coating of fine particles used for the production of functional materials. A new process of coating of fine particles in the form of agglomerates was developed in a moving-bed CVD reactor and discussed in some details. Then, the effect of the process conditions and the agglomerate structural parameters are examined by using a comprehensive mathematical model with the aim of maximizing the uniformity of coating deposits in the radial direction of the agglomerate at a desired quantity of deposit.  Finally, the mechanical and thermal properties of silicon nitride fine particles coated with aluminum nitride obtained by hot-press sintering are experimentally measured and compared with those of silicon nitride itself.

Buy this Article


Buy this article
Buy this volume
Subscribe to this title
Shopping Cart

Quick Links
Search Products
Browse in Alphabetical Order : Journals
Browse by Subject Classification : Journals

Ordering Information Ordering Information
Downloadable forms Downloadable Forms