1 |
Recent development in microfabrication of solid surface by UV and VUV lasers
Pages 1 -
12
Koichi Toyoda
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2 |
Nitridation of silicon and thermal silica films in low ammonia pressures
Pages 13 -
56
A. Glachant
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3 |
Vacuum systems for electron storage rings
Pages 57 -
65
J. C. Schuchman
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4 |
Sputtering techniques employing electron cyclotron resonance and electric-mirror excitations for film deposition
Pages 67 -
93
Morito Matsuoka
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5 |
Opposite behaviors of surface reactivities of GaAs and InP semiconductor compounds
Pages 95 -
118
J. L. Sculfort
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6 |
Analysis of typical transformations of III-V / electrolyte interfaces by X.P.S. measurements
Pages 119 -
139
J. L. Sculfort
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7 |
Interaction of organic and organometallic molecules with semiconductor surfaces: Adsorption mechanisms and chemical reactivity
Pages 141 -
148
M. N. Piancastelli
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8 |
Ion-assisted doping of p-type CdTe films
Pages 149 -
159
Richard H. Bube, Alan L. Fahrenbruch, Donghwan Kim, Adolfo Lopez-Otero
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9 |
Characterization of a-C: H thin films
Pages 161 -
181
A. Reyes-Mena, J. González-Hernández, R. Asomoza
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10 |
The interface between a metal organic chemical vapor deposition CdTe epilayer and a CdTe substrate
Pages 183 -
192
Y. Nemirovsky, A. Ruzin, A. Bezinger
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11 |
STM characterization of chemical sensors
Pages 193 -
208
Michael A. George, William S. Glaunsinger
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12 |
Molecular layer epitaxy
Pages 209 -
222
Jun-ichi Nishizawa, Hiroshi Sakuraba
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13 |
Cluster model study of surfaces and adsorption phenomena on diamond-like crystals(C,Si and Ge)
Pages 223 -
249
Marirosa Toscano
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14 |
Glow discharge sputtering systems: Generation, transport and deposition of atomic species
Pages 251 -
284
I. Abril, A. Gras-Martí, J. J. Jiménez-Rodríguez, V. Konoplev, J. C. Moreno-Marín, A. M. C. Pérez-Martín
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15 |
Structural and chemical-physical characterization of metal microclusters and their oxidization
Pages 285 -
312
Marco Diociaiuti, Luigi Paoletti
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16 |
Solid-state device characterization with a scanning tunneling microscope
Pages 313 -
327
S. Kordić
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17 |
The ion assistance in optical coating deposition processes
Pages 329 -
358
S. Scaglione, L. Caneve, A. Tirabassi
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18 |
Production of thin films by arc-evaporation
Pages 359 -
369
H. Ehrich
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19 |
Electronic and geometric structure of ultrathin alkali-metal-GaAs(110) interfaces
Pages 371 -
380
N. J. DiNardo, C. A. Ventrice Jr., T. Maeda Wong, A. J. Smith, D. Heskett, A. B. McLean, W. R. Graham, E. W. Plummer
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20 |
Thin semiconducting films deposited by plasma chemical vapour: Deposition technology and applications
Pages 381 -
385
P. Rava
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21 |
Optoelectronic devices in the adverse environment: Vacuum and gamma irradiation
Pages 387 -
392
S. Hava
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22 |
Thin film ferroelectric memory devices: Fabrication, processing and properties
Pages 393 -
415
Anand K. Kulkarni
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23 |
High-resolution electron energy-loss spectroscopy-a fascinating tool for studying semiconductor surfaces and interfaces
Pages 417 -
432
J. A. Schaefer
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24 |
Progress in depth profiling with Angle Dependent X-ray Photo Electron Spectroscopy
Pages 433 -
443
Bonnie J. Tyler
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