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Trends in Vacuum Science & Technology   Volumes
Trends in Vacuum Science & Technology
Volume 2
Published in 1997
Table of Contents
1 Hydrogen-related functional materials
Pages  1 -  23
Kenji Ichimura
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2 Flux characteristics of reactive particles in submicron dry etching techniques
Pages  25 -  46
Joachim Janes
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3 Complex surface-structures formed by restructuring-type adsorption of Li atoms on Cu (001), Cu (110) and Cu (111)
Pages  47 -  76
Hiroshi Tochihara
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4 Surface and interface properties of Cu-chalcopyrite semiconductors and devices
Pages  77 -  112
R. Scheer
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5 Appearance potential spectroscopy: a surface sensitive technique to characterize materials
Pages  113 -  121
A. R. Chourasia
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6 A unique multichamber synthesis and analysis system for catalysis modeling
Pages  123 -  129
J. Paul, C. M. Pradier, T. Levola, E. Supponen, J. Vanhatalo
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7 Basic laboratory techniques for thin film developments: spectrophotometry, ellipsometry and computer simulation
Pages  131 -  138
S. Bosch
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8 A review of plasma-etching-induced damage to submicron field-effect transistors
Pages  139 -  164
Osama O. Awadelkarim, Motasim El Hassan, Ahmed Salah
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9 State resolved probe of surface reaction dynamics
Pages  165 -  178
X.-Y. Zhu
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